Modification and Sputtering of Inhomogeneous Multilayer Oxidized Metal Films by Low-Current Argon Ion Beams

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Abstract

Results of generation of various suboxide layers on various thin oxidized niobium films by modification and sputtering of their surfaces with low-current argon ion beams are reported. Niobium films of various thicknesses were grown by magnetron sputtering on oxidized silicon substrates. Few stages of delicate ion bombardment were performed. The surface of films was studied by means of non-destructive methods of X-ray photoelectron spectroscopy and angle-resolved X-ray photoelectron spectroscopy. Chemical and phase film profiling was performed. It was found that during air exposure of niobium films of various thicknesses, layers of pentoxide and various stoichiometric and non-stoichiometric oxides had been generated. During ion bombardment, composition and thicknesses of the films did not change. Numerical modelling results showed that by delicate ion bombardment atoms of oxygen were mostly sputtered. It was the surface pentoxide niobium layer that was sputtered and modified. It was found that different layers of stoichiometric suboxides and pentoxides of other phases different from the initial phases had been formed. The composition of surface suboxide layers changed slightly. The results of this research show opportunity of generation of suboxide layers of various composition and thicknesses by changing parameters of ion irradiation of metal film surface.

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About the authors

D. S. Lukiantsev

Moscow Power Engineering Institute

Author for correspondence.
Email: LukyantsevDS@mpei.ru
Russian Federation, Moscow

A. V. Lubenchenko

Moscow Power Engineering Institute

Email: LukyantsevDS@mpei.ru
Russian Federation, Moscow

D. A. Ivanov

Moscow Power Engineering Institute

Email: LukyantsevDS@mpei.ru
Russian Federation, Moscow

A. B. Pavolotsky

Chalmers University of Technology

Email: LukyantsevDS@mpei.ru
Sweden, Gothenburg

O. I. Lubenchenko

Moscow Power Engineering Institute

Email: LukyantsevDS@mpei.ru
Russian Federation, Moscow

I. V. Ivanova

Moscow Power Engineering Institute

Email: LukyantsevDS@mpei.ru
Russian Federation, Moscow

O. N. Pavlov

Moscow Power Engineering Institute

Email: LukyantsevDS@mpei.ru
Russian Federation, Moscow

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Supplementary files

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2. Fig. 1. Detailed spectrum of the Nb line of a 100 nm 3d film after the second stage of exposure at a 0° sensing angle. The experimental data are indicated by circles, the theoretical interpretation of the spectrum is represented by a solid line, and partial theoretical spectra are shaded in areas

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3. Fig. 2. Detailed spectrum of the Nb line of a 100 nm 3d film after the first stage of exposure at a sensing angle of 40°. The experimental data are indicated by circles, the theoretical interpretation of the spectrum is represented by a solid line, and partial theoretical spectra are shaded in areas

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4. Fig. 3. Overview spectra of a 10 nm thick film before (1) and after three stages of ion exposure lasting 10 (2), 20 (3) and 30 minutes (4) and the results of chemical qualitative and quantitative analysis (the content of elements is indicated in %)

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5. Fig. 4. Decomposition of the Nb 3d spectral line after ionic modification (a). The results of decomposition of the Nb 3d spectral line of a 10 nm film before (1) and after ionic exposure lasting 10 minutes (2), 20 minutes (3) and 30 minutes (4) (b). The experimental data are indicated by circles, solid line – theoretical interpretation of the spectrum, partial theoretical spectra with shaded areas

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6. Fig. 5. Detailed spectra of the Nb 3d line of an oxidized niobium film with a thickness of 100 nm: 1 – before ion exposure; 2 – after the first stage; 3 – after the second stage

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7. Fig. 6. Detailed spectrum of the Nb 3d line before ion exposure. The experimental data are indicated by circles, the theoretical interpretation of the spectrum is represented by a solid line, and partial theoretical spectra are shaded in areas

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